libri scuola books Fumetti ebook dvd top ten sconti 0 Carrello


Torna Indietro

meichsner jurgen (curatore); schmidt martin (curatore); schneider ralf (curatore); wagner hans-erich (curatore) - nonthermal plasma chemistry and physics

Nonthermal Plasma Chemistry and Physics

; ; ;




Disponibilità: Normalmente disponibile in 20 giorni
A causa di problematiche nell'approvvigionamento legate alla Brexit sono possibili ritardi nelle consegne.


PREZZO
234,98 €
NICEPRICE
223,23 €
SCONTO
5%



Questo prodotto usufruisce delle SPEDIZIONI GRATIS
selezionando l'opzione Corriere Veloce in fase di ordine.


Pagabile anche con Carta della cultura giovani e del merito, 18App Bonus Cultura e Carta del Docente


Facebook Twitter Aggiungi commento


Spese Gratis

Dettagli

Genere:Libro
Lingua: Inglese
Editore:

CRC Press

Pubblicazione: 03/2011
Edizione: 1° edizione





Note Editore

In addition to introducing the basics of plasma physics, Nonthermal Plasma Chemistry and Physics is a comprehensive presentation of recent developments in the rapidly growing field of nonthermal plasma chemistry. The book offers a detailed discussion of the fundamentals of plasma chemical reactions and modeling, nonthermal plasma sources, relevant diagnostic techniques, and selected applications. Elucidating interconnections and trends, the book focuses on basic principles and illustrations across a broad field of applications. Expert contributors address environmental aspects of plasma chemistry. The book also includes selected plasma conditions and specific applications in volume plasma chemistry and treatment of material surfaces such as plasma etching in microelectronics, chemical modification of polymer surfaces and deposition of functional thin films. Designed for students of plasma physics, Nonthermal Plasma Chemistry and Physics is a concise resource also for specialists in this and related fields of research.




Sommario

IntroductionNonthermal Plasma Chemical Processes of General InterestPhysics of Nonthermal PlasmasNonthermal Plasma Chemical ReactorsElementary Processes on Surfaces in Plasma–Wall InteractionPlasma DiagnosticsSurface and Thin Film AnalysisSelected ApplicationsModeling and SimulationTrends and New Concepts










Altre Informazioni

ISBN:

9781420059168

Condizione: Nuovo
Dimensioni: 9 x 6 in Ø 2.67 lb
Formato: Copertina rigida
Illustration Notes:242 b/w images, 43 tables and Approx 625 - 650 equations
Pagine Arabe: 562


Dicono di noi